Optimization Design and Fabrication of Photonic Crystal Waveguides Based on SOI Using 248nm Deep UV Lithography

XIE L; ZHANG Y; PENG X; XIE S

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J-GLOBAL ID：200902247452343344 Reference number：04A0470740

Optimization Design and Fabrication of Photonic Crystal Waveguides Based on SOI Using 248nm Deep UV Lithography

248nm深UVリソグラフィーを用いたSOIベースのフォトニック結晶導波路の最適設計と作製

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Material：
Volume： 5280 Issue： Pt.2 Page： 798-804 Publication year： 2004
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Optical waveguide,optical fibers,and fiber optics , Quantum optics in general , Manufacturing technology of solid-state devices

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