Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

NIWA D; HOMMA T; OSAKA T

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J-GLOBAL ID：200902256447396846 Reference number：04A0563959

Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

アルカリ水溶液中のSi(100)表面上へのNiの析出機構

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Material：
Volume： 108 Issue： 28 Page： 9900-9904 Publication year： Jul. 15, 2004
JST Material Number： W0921A ISSN： 1520-6106 CODEN： JPCBFK Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Solid-liquid interface , Inorganic compounds and elements in general , Other noncatalytic reactions , Manufacturing technology of solid-state devices , Electroless plating

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