Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

NIWA D; HOMMA T; OSAKA T

Art

J-GLOBAL ID：200902256447396846 Reference number：04A0563959

Deposition Mechanism of Ni on Si(100) Surfaces in Aqueous Alkaline Solution

アルカリ水溶液中のSi(100)表面上へのNiの析出機構

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=04A0563959&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0563959&from=J-GLOBAL&jstjournalNo=W0921A") }}

Author (3)： , ,
Material：
Volume： 108 Issue： 28 Page： 9900-9904 Publication year： Jul. 15, 2004
JST Material Number： W0921A ISSN： 1520-6106 CODEN： JPCBFK Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

,...
,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0563959&from=J-GLOBAL&jstjournalNo=W0921A") }}

Solid-liquid interface , Inorganic compounds and elements in general , Other noncatalytic reactions , Manufacturing technology of solid-state devices , Electroless plating

, , ,

Return to Previous Page