Art

J-GLOBAL ID：200902256970440549   Reference number：06A0183634

Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition

表面波マイクロ波プラズマ化学蒸着で成長した窒素化炭素薄膜の光電特性に及ぼすメタンガス流速の影響

Author (6)： RUSOP M. (Dep. of Environmental Technol. and Urban Planning, Nagoya Inst. of Technol., Gokiso-cho, Showa-ku, Nagoya 466-8555, JPN) ,  ADHIKARI S. (Dep. of Electronic Engineering, Fac. of Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai 487-8501, JPN) ,  OMER A.m.m. (Dep. of Electronic Engineering, Fac. of Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai 487-8501, JPN) ,  SOGA T. (Dep. of Environmental Technol. and Urban Planning, Nagoya Inst. of Technol., Gokiso-cho, Showa-ku, Nagoya 466-8555, JPN) ,  JIMBO T. (Res. Center for Nano-Device and System, Nagoya Inst. of Technol., Gokiso-cho, Showa-ku, Nagoya 466-8555, JPN) ,  UMENO M. (Dep. of Electronic Engineering, Fac. of Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai 487-8501, JPN)
Material： Diamond and Related Materials  (Diam Relat Mater)
Volume： 15  Issue： 2-3  Page： 371-377  Publication year： Feb. 2006 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *Carbon ,...
Semi thesaurus term： *plasma enhanced chemical vapor deposition ,...

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0183634&from=J-GLOBAL&jstjournalNo=W0498A") }}

JST classification (2)： Carbon and its compounds  (YB02060D) ,  Thin films of other inorganic compounds  (BK14060A)

Substance index (1)： Methane

Terms in the title (8)： 表面波 ,  マイクロ波プラズマ化学蒸着 ,  成長 ,  窒素 ,  炭素薄膜 ,  光電特性 ,  メタンガス ,  流速