Oxygen impurity doping into ultrapure hydrogenated microcrystalline Si films

KAMEI T; WADA T

Art

J-GLOBAL ID：200902257023453382 Reference number：04A0628689

Oxygen impurity doping into ultrapure hydrogenated microcrystalline Si films

極めて純度の高い水素化微結晶Si薄膜中への酸素不純物のドーピング

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=04A0628689&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0628689&from=J-GLOBAL&jstjournalNo=C0266A") }}

Author (2)： ,
Material：
Volume： 96 Issue： 4 Page： 2087-2090 Publication year： Aug. 15, 2004
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0628689&from=J-GLOBAL&jstjournalNo=C0266A") }}

Lattice defects in semiconductors , Electric conduction in crystalline semiconductors

, , , , , ,

Return to Previous Page