Art

J-GLOBAL ID：200902257263707136   Reference number：09A0235924

Effect of the surface of a silicon substrate on the growth of ZnO films by a wet process

湿式法によるZnO膜の成長に及ぼすシリコン基板表面の影響

Author (5)： SEGAWA Hiroyo (Dep. of Chemistry and Materials Sci., Graduate School of Sci. and Engineering, Tokyo Inst. of Technol.) ,  IZUMI Reiko (Central Res. Inst. Naka Res. Center, Mitsubishi Materials Corp.) ,  HAYASHI Toshiharu (Central Res. Inst. Naka Res. Center, Mitsubishi Materials Corp.) ,  YANO Tetsuji (Dep. of Chemistry and Materials Sci., Graduate School of Sci. and Engineering, Tokyo Inst. of Technol.) ,  SHIBATA Shuichi (Dep. of Chemistry and Materials Sci., Graduate School of Sci. and Engineering, Tokyo Inst. of Technol.)
Material： Journal of the Ceramic Society of Japan  (JCS-Japan)
Volume： 117  Issue： 1363  Page： 289-293 (J-STAGE)  Publication year： 2009 
JST Material Number： F0382A  ISSN： 1882-0743  CODEN： JCSJEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *zinc oxide ,  *thin film growth ,  wet method ,  chemical synthesis ,  wafer ,  surface quality ,  polyethylene oxide ,  pH dependence ,  surface structure ,  *micro structure ,  powder ,  X-Ray Diffraction ,  scanning electron microscope ,  precursor (substance) ,  reaction path ,  solar cell ,  surface morphology ,  Si wafer ,  film solar cell ,  structure
Semi thesaurus term： Silicon substrate ,  polyethylene glycol ,  microstructure ,  powder ,  thin film solar cell

JST classification (1)： Oxide thin films  (BK14050P)

Substance index (1)： NH4+

Reference (19)：

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Terms in the title (5)： 湿式法 ,  ZnO ,  成長 ,  シリコン ,  基板表面