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J-GLOBAL ID：200902257265817699   Reference number：07A0026172

Crust formation mechanism in a 193-nm photoresist after low-k dry etch

低kドライエッチ後の193nmホトレジスト中のクラスト形成機構
Author (11)：
KESTERS E.

About KESTERS E.

(IMEC vzw, Heverlee, BEL)

About IMEC vzw, Heverlee, BEL

, 
CLAES M.

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(IMEC vzw, Heverlee, BEL)

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, 
LE Q. T.

About LE Q. T.

(IMEC vzw, Heverlee, BEL)

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, 
FRANQUET A.

About FRANQUET A.

(IMEC vzw, Heverlee, BEL)

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, 
VEREECKE G.

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(IMEC vzw, Heverlee, BEL)

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, 
CARLEER R.

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(Universiteit Hasselt, Diepenbeek, BEL)

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, 
ADRIAENSENS P.

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(Universiteit Hasselt, Diepenbeek, BEL)

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, 
VANDERZANDE D.

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(Universiteit Hasselt, Diepenbeek, BEL)

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, 
BIEBUYK J. J.

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(UCL, Louvain-La-Neuve, BEL)

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, 
VAN VELTEM P.

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(UCL, Louvain-La-Neuve, BEL)

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, 
BEBELMAN S.

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(UCL, Louvain-La-Neuve, BEL)

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Material：
Proceedings of International Symposium on Dry Process  (Proc Int Symp Dry Process)

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Volume： 6th  Page： 325-326  Publication year： 2006 
JST Material Number： Y0378B  Document type： Proceedings
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
Abstract/Point：
Abstract/Point
Japanese summary of the article(about several hundred characters).
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The characterization of photor...
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*photoresist

About photoresist

,...
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Thesaurus term/Semi thesaurus term
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critical dimension

About critical dimension

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

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Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
エッチ

About エッチ

, 
ホトレジスト

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, 
クラスト

About クラスト


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