About ABE Haruhiko
About LTEC Corp., Hyogo, JPN
About YONEDA Masahiro
About Renesas Technol. Corp., Hyogo, JPN
About FUJIWARA Nobuo
About Renesas Technol. Corp., Hyogo, JPN
About Japanese Journal of Applied Physics
About plasma etching
About semiconductor device
About etching
About RIE
About cleaning(washing)
About plasma treatment
About dry etching
About via hole
About isolation(IC)
About trench cut(processing)
About length
About semiconductor process
About 等方的エッチング
About reactive ion etching
About プラズマ洗浄
About gate stack
About STI
About critical dimension
About Manufacturing technology of solid-state devices
About 半導体素子製造
About プラズマエッチング技術
About 開発