Analysis of Metal Impurity in Hf Oxide Originated in Source Materials and Its Impact on TDDB Lifetime

INOUE MASAO; TSUCHIMOTO JUN'ICHI; NOMURA KOJI; MIZUTANI MASAHARU; YUGAMI JIRO; YOSHIMURA HIDEFUMI; KOJIMA MASAYUKI

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J-GLOBAL ID：200902261162313630 Reference number：07A0762978

Analysis of Metal Impurity in Hf Oxide Originated in Source Materials and Its Impact on TDDB Lifetime

原材料に起因したHf酸化膜中メタル不純物の分析とTDDB寿命への影響

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Author (7)： , , , , , ,
Material：
Volume： 71st Page： 23-26 Publication year： Jul. 12, 2007
JST Material Number： F0108B Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Measurement,testing and reliability of solid-state devices , Insulating materials , LCR parts

Reference (3)：

INOUE, M. IEDM tech. Dig., 2005. 2005, 425
HAYASHI, T. IEDM tech. Dig., 2005. 2005, 927
電子材料. 2001, 5月号

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