Art

J-GLOBAL ID：200902264275652589   Reference number：08A0569166

Deposition of DLC film from adamantane by using pulsed discharge plasma CVD

パルス放電プラズマCVD法を用いたアダマンタンからのDLC膜の蒸着

Author (4)： UMENO M. (Dep. of Electronics and Information Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai-shi, Aichi-Ken, 487-8501, JPN) ,  NODA M. (Dep. of Electronics and Information Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai-shi, Aichi-Ken, 487-8501, JPN) ,  UCHIDA H. (Dep. of Electronics and Information Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai-shi, Aichi-Ken, 487-8501, JPN) ,  TAKEUCHI H. (Dep. of Electronics and Information Engineering, Chubu Univ., Matsumoto-cho 1200, Kasugai-shi, Aichi-Ken, 487-8501, JPN)
Material： Diamond and Related Materials  (Diam Relat Mater)
Volume： 17  Issue： 4-5  Page： 684-687  Publication year： Apr. 2008 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 短報  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *DLC film ,  film production ,  *plasma CVD ,  micro structure ,  dopant ,  iodine ,  lattice defect ,  band gap ,  optical absorption ,  photoelectric effect ,  cycloalkane ,  bridged compound

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Carbon and its compounds  (YB02060D)

Substance index (1)： Adamantane

Terms in the title (5)： パルス放電 ,  プラズマCVD法 ,  アダマンタン ,  DLC膜 ,  蒸着