About TAKASHIMA Hiroshi
About National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN
About SHIMADA Kohei
About Meiji Univ., Kanagawa, JPN
About MIURA Noboru
About Meiji Univ., Kanagawa, JPN
About KATSUMATA Tetsuhiro
About Gakushuin Univ., Tokyo, JPN
About INAGUMA Yoshiyuki
About Gakushuin Univ., Tokyo, JPN
About UEDA Kazushige
About Kyushu Inst. of Technol., Kitakyushu, JPN
About ITOH Mitsuru
About Tokyo Inst. of Technol., Yokohama, JPN
About Advanced Materials
About electroluminescence
About titanate
About strontium compound
About doping
About niobium compound
About thin film
About perovskite type crystal
About voltage
About substrate (plate)
About laser ablation
About calcium compound
About praseodymium compound
About phosphor
About cerium oxide
About buffer material
About electrode
About epitaxy
About X-Ray Diffraction
About crystal structure
About RHEED
About threshold
About field intensity
About permittivity
About ITO electrode
About epitaxial growth
About drive voltage
About electric field intensity
About thin-film electroluminescence
About Oxide thin films
About Light emitting devices
About Crystal structure of metal oxides and chalcogenides
About Solid-solid interface
About ペロブスカイト
About 駆動電圧
About エレクトロルミネセンス