Art

J-GLOBAL ID：200902271241070749   Reference number：05A0599738

Microscopic investigations of aluminum nitride thin films grown by low-temperature reactive sputtering

低温反応性スパッタリングにより成長させた窒化アルミニウム薄膜の微視的研究

Author (5)： GUO Q.x. (Dep. of Electrical and Electronic Engineering, Fac. of Sci. and Engineering, Saga Univ., Saga 840-8502, JPN) ,  YOSHITUGU M. (Dep. of Electrical and Electronic Engineering, Fac. of Sci. and Engineering, Saga Univ., Saga 840-8502, JPN) ,  TANAKA T. (Dep. of Electrical and Electronic Engineering, Fac. of Sci. and Engineering, Saga Univ., Saga 840-8502, JPN) ,  NISHIO M. (Dep. of Electrical and Electronic Engineering, Fac. of Sci. and Engineering, Saga Univ., Saga 840-8502, JPN) ,  OGAWA H. (Dep. of Electrical and Electronic Engineering, Fac. of Sci. and Engineering, Saga Univ., Saga 840-8502, JPN)
Material： Thin Solid Films
Volume： 483  Issue： 1-2  Page： 16-20  Publication year： Jul. 01, 2005 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *aluminum nitride ,...

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JST classification (1)： Semiconductor thin films  (BK14040E)

Terms in the title (6)： 低温 ,  反応性スパッタリング ,  成長 ,  窒化アルミニウム ,  薄膜 ,  研究