Art

J-GLOBAL ID：200902282133591220   Reference number：08A0273150

Chemical vapor deposition of phase-rich WC thin films on silicon and carbon substrates

けい素および炭素基板上の多くの相を含むWC薄膜の化学蒸着

Author (5)： BEADLE Kendra A. (Dep. of Chemical Engineering, Center for Catalytic Sci. and Technol. (CCST), Univ. of Delaware, Newark, DE 19716, USA) ,  GUPTA Rahul (Dep. of Chemical Engineering, Center for Catalytic Sci. and Technol. (CCST), Univ. of Delaware, Newark, DE 19716, USA) ,  MATHEW Anoop (Dep. of Materials Sci. and Engineering, Univ. of Delaware, Newark, DE 19716, USA) ,  CHEN Jingguang G. (Dep. of Chemical Engineering, Center for Catalytic Sci. and Technol. (CCST), Univ. of Delaware, Newark, DE 19716, USA) ,  WILLIS Brian G. (Dep. of Chemical Engineering, Center for Catalytic Sci. and Technol. (CCST), Univ. of Delaware, Newark, DE 19716, USA)
Material： Thin Solid Films
Volume： 516  Issue： 12  Page： 3847-3854  Publication year： Apr. 30, 2008 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： silicon ,  Carbon ,  amorphous state ,  silicon dioxide ,  tungsten chloride ,  Hydrogen ,  Argon ,  multiphase ,  X-ray photoelectron spectrum ,  scanning electron microscope ,  electron microscopy ,  Oxygen ,  concentration distribution ,  *tungsten carbide ,  *thin film ,  thin film growth ,  substrate (plate) ,  phase separation ,  property ,  alkene ,  Adhesiveness
Semi thesaurus term： adhesiveness

JST classification (1)： Thin films of other inorganic compounds  (BK14060A)

Substance index (1)： Propylene

Terms in the title (6)： けい素 ,  炭素 ,  相 ,  WC ,  薄膜 ,  化学蒸着