Art
J-GLOBAL ID：200902290224122390
Reference number：05A0293296
Characterization of the interfacial reaction between sputter-deposited Ni film and Si substrate
スパッタ蒸着したNi膜とSi基板との間の界面反応の評価
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Author (5)：
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Material：
Volume：
A80
Issue：
1
Page：
179-182
Publication year：
Jan. 2005
JST Material Number：
D0256C
ISSN：
0947-8396
CODEN：
APHYCC
Document type：
Article
Article type：
原著論文
Country of issue：
Germany, Federal Republic of (DEU)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Metallic thin films
, Other noncatalytic reactions
, Manufacturing technology of solid-state devices
Terms in the title (5)：
Terms in the title
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