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J-GLOBAL ID：200902295123619490   Reference number：08A0020828

Mitigation of fast ions generated from laser-produced Sn plasma for extreme ultraviolet light source by H2 gas

極端紫外光源用のレーザ生成Snプラズマから発生する高速イオンのH₂ガスによる低減

Author (6)： NAKAMURA Daisuke (Dep. of Electrical and Electronic Systems Engineering, Graduate School of Information Sci. and Electrical ...) ,  TAMARU Koji (Dep. of Electrical and Electronic Systems Engineering, Graduate School of Information Sci. and Electrical ...) ,  HASHIMOTO Yuki (Dep. of Electrical and Electronic Systems Engineering, Graduate School of Information Sci. and Electrical ...) ,  OKADA Tatsuo (Dep. of Electrical and Electronic Systems Engineering, Graduate School of Information Sci. and Electrical ...) ,  TANAKA Hiroki (Electronic Information Section, Basic Technol. Div., Industrial Technol. Center of Nagasaki, 2-1303-8 Ikeda, Omura ...) ,  TAKAHASHI Akihiko (Dep. of Health Sciences, School of Medicine, Kyushu Univ., 3-1-1 Maidashi, Higashi-ku, Fukuoka 812-8582, JPN)
Material： Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)
Volume： 102  Issue： 12  Page： 123310  Publication year： Dec. 15, 2007 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： ultraviolet source ,...

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JST classification (3)： Light sources  (BD07020D) ,  Applications of plasma  (BJ02110K) ,  Light sources,lighting apparatus  (NB12020F)

Terms in the title (6)： 極端紫外光源 ,  レーザ ,  Sn ,  プラズマ ,  高速イオン ,  H2ガス