Optimum Adjustment for Distortion in Semiconductor Lithography Equipment

FUKAGAWA YOZO; SHINANO YUJI; NAKAMORI MARIO

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J-GLOBAL ID：200902295639206140 Reference number：06A0913793

Optimum Adjustment for Distortion in Semiconductor Lithography Equipment

半導体露光装置におけるディストーション調整の最適化

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Material：
Volume： 72 Issue： 722 Page： 3378-3382 Publication year： Oct. 25, 2006
JST Material Number： F0045B ISSN： 0387-5024 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Manufacturing technology of solid-state devices

Reference (6)：

FLACK, W. W. Efficient overlay optimization of stepper correctables. Metrology, Inspection, and Process Control for Microlithography X Proceedings, 1996. 1996, 400-413
AOKI, A. Method for Correcting Alignment Error in Aligner and Aligner Using it, JP10-022190. Patent journal. 1998
IGNIZIO, J. P. Linear Programming in Single-& Multiple-Objective Systems. 1982
MORI, M. Operations Research. 2004, 78-79
KONNO, H. Linear Programming. 1987

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