Art
J-GLOBAL ID：200902299477582424   Reference number：03A0471267

Development of high frequency micro plasma source in a magnetic field

磁場中の高周波マイクロプラズマ源の開発
Author (3)：
MATSUSHITA M

About MATSUSHITA M

(Nagasaki Univ., Nagasaki, JPN)

About Nagasaki Univ., Nagasaki, JPN

, 
MATSUDA Y

About MATSUDA Y

(Nagasaki Univ., Nagasaki, JPN)

About Nagasaki Univ., Nagasaki, JPN

, 
FUJIYAMA H

About FUJIYAMA H

(Nagasaki Univ., Nagasaki, JPN)

About Nagasaki Univ., Nagasaki, JPN


Material：
Thin Solid Films

About Thin Solid Films


Volume： 435  Issue： 1/2  Page： 285-287  Publication year： Jul. 01, 2003 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 短報  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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Xenon

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,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Plasma devices 
(BJ02082I)

About Plasma devices

,  Gas discharges 
(BJ03020T)

About Gas discharges

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
磁場

About 磁場

, 
高周波

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, 
マイクロプラズマ

About マイクロプラズマ

, 
開発

About 開発


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