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J-GLOBAL ID:200902299895483955   Reference number:04A0537682

Photochemical Modification of Silicone Films Using F2 Laser for Selective Chemical Etching

選択的化学エッチングにF2レーザを使ったシリコーンフィルムの光化学的表面改質
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Volume: 43  Issue: 6A  Page: 3438-3442  Publication year: Jun. 15, 2004 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Laser irradiation effects and damages  ,  Manufacturing technology of solid-state devices 
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