Recent advances in electron-beam lithography for the high-volume production of VLSI devices.

PFEIFFER H C

Art

J-GLOBAL ID：201002087655157787 Reference number：79A0259862

Recent advances in electron-beam lithography for the high-volume production of VLSI devices.

VLSI素子の大量生産に対する電子ビーム露光の最近の進歩

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Volume： 26 Issue： 4 Page： 663-674 Publication year： 1979
JST Material Number： C0222A ISSN： 0018-9383 CODEN： IETDA Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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