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J-GLOBAL ID:201002286458785558   Reference number:10A0490915

Suspended Quantum Dot Fabrication on a Heavily Doped Silicon Nanowire by Suppressing Unintentional Quantum Dot Formation

意図しない量子ドット形成を抑えることによる吊りヘビードープシリコンナノワイヤ上の量子ドットの作製
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Volume: 49  Issue: 4,Issue 1  Page: 044001.1-044001.5  Publication year: Apr. 25, 2010 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Transistors  ,  Atomic and molecular clusters 
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