Art

J-GLOBAL ID：201102214302045151   Reference number：11A0825838

Fabrication of Au Microstructure Using ICP-RIE

ICPエッチングによる微細構造体を用いた金構造体の作製

Author (3)： NODA DAIJI (兵庫県大 高度産業科技研) ,  TOKUOKA ATSUSHI (兵庫県大 高度産業科技研) ,  HATTORI TADASHI (兵庫県大 高度産業科技研)
Material： 日本機械学会論文集 C編(Web)  (Transactions of the Japan Society of Mechanical Engineers. Series C (Web))
Volume： 77  Issue： 775  Page： 691-697 (WEB ONLY)  Publication year： 2011 
JST Material Number： U0184A  ISSN： 1884-8354  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *dry etching ,  optical element ,  MEMS ,  *micromachining ,  Electroplating ,  *Gold ,  gold plating ,  scanning electron microscope ,  micro structure
Semi thesaurus term： electrolytic plating

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Reference (11)：

• (1) Becker, E. W, Ehrfeld, W., Hagmann, P., Maner, A. and Munchmeyer D., “Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)”, Microelectronic. Engineering, Vol. 4, No. 1 (1986), pp. 35-56.
• (2) Hirata, Y., “LIGA process - micromachining technique using synchrotron radiation lithography - and some industrial applications”, Nuclear Instruments and Methods in Physics Research Section B, Vol. 208 (2003), pp. 21-26.
• (3) Malek, C.K. and Saile, V., “Applications of LIGA technology to Precision manufacturing of high-aspect-ratio micro-components and -systems”, Microelectronics Journal, Vol. 35, No. 2 (2004), pp. 131-143.
• (4) Bischofberger, R., Zimmermann, H. and Staufert, G., “Low-cost MARMS process”, Sensors and Actuators A, Vol. 61, No. 1-3 (1997), pp. 392-399.
• (5) Malek, C.K., “SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMS”, Microelectronics Journal, Vol. 33, No. 1-2 (2002), pp. 101-105.

Terms in the title (6)： ICP ,  エッチング ,  微細構造体 ,  金 ,  構造体 ,  作製