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J-GLOBAL ID:201102223510561464   Reference number:11A0825831

The Effect of Substrate Temperature, Nitrogen Ionbeam Acceleration Voltage, and Deposition Rate on Hardness of Carbon Nitride Coating

CNx膜の硬さに及ぼす成膜時基板温度・窒素イオンビーム加速電圧・成膜速度の影響
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Volume: 77  Issue: 775  Page: 624-630 (WEB ONLY)  Publication year: 2011 
JST Material Number: U0184A  ISSN: 1884-8354  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Applications of electron beams and ion beams 
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