Art
J-GLOBAL ID:201102276157091374   Reference number:11A1782045

Deposition of microcrystalline intrinsic silicon by EAE technique

EAE手法による微結晶粒真性シリコンの蒸着
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Volume: 11th  Page: 238-243  Publication year: Jul. 06, 2011 
JST Material Number: L8264A  ISSN: 0917-2440  Document type: Proceedings
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor thin films 
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