Art

J-GLOBAL ID：201202213666402783   Reference number：12A1429716

Overlay metrology for low-k₁: Challenges and solutions

低k₁のための重ね合わせメトロロジ:挑戦とソリューション

Author (15)： NEUMANN Jens Timo (Carl Zeiss SMT GmbH, Oberkochen, DEU) ,  LEE Jongsu (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  YANG Kiho (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  LEE Byounghoon (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  LEE Taehyeong (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  PARK Jeongsu (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  LIM Chang-Moon (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  YIM Donggyu (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  PARK Sungki (Hynix Semiconductor Inc., Kyungki-do, KOR) ,  JANDA Eric (ASML, Veldhoven, NLD) ,  BHATTACHARYYA Kaustuve (ASML, Veldhoven, NLD) ,  RYU Chan-Ho (ASML Korea, Gyunggi-do, KOR) ,  MIN Young-Hong (ASML Korea, Gyunggi-do, KOR) ,  RHE Kiki (ASML Korea, Gyunggi-do, KOR) ,  GEH Bernd (Carl Zeiss S.M.T. Inc., AZ, USA)
Material： Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)
Volume： 8326  Issue： Pt.1  Page： 832602.1-832602.21  Publication year： 2012 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *measurement ,  technology ,  *superposition ,  *lithography ,  exposure(photography) ,  photolithography ,  simulation ,  resist ,  diffraction ,  center
Semi thesaurus term： immersion lithography ,  immersion exposure ,  measurement technique ,  optic axis

JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Measuring methods and instruments of length,area,cross section,volume,angle  (AD05020O)

Terms in the title (2)： 重ね合わせ ,  ソリューション