Art

J-GLOBAL ID：201302266713098668   Reference number：13A0363688

Simple Low-Outgassing Atomic Hydrogen Source

低脱ガス原子状水素源

Author (9)： ARAE Sadanori (Fac. of Engineering, Yokohama National Univ.) ,  YAMAZAKI Takahiko (Fac. of Engineering, Yokohama National Univ.) ,  YANASE Kohtaro (Fac. of Education, Gunma Univ.) ,  OCHI Keita (Fac. of Education, Gunma Univ.) ,  ISHII Asuka (Fac. of Education, Gunma Univ.) ,  OKUSAWA Makoto (Fac. of Education, Gunma Univ.) ,  MASE Kazuhiko (Inst. of Materials Structure Sci., KEK) ,  MASE Kazuhiko (The Graduate Univ. for Advanced Studies) ,  TANAKA Masatoshi (Fac. of Engineering, Yokohama National Univ.)
Material： Journal of the Vacuum Society of Japan  (真空)
Volume： 55  Issue： 8  Page： 403-404 (J-STAGE)  Publication year： 2012 
JST Material Number： G0194A  ISSN： 1882-2398  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *degassing ,  Hydrogen ,  filament ,  *hydrogenation ,  gas ,  low energy electron diffraction ,  Auger spectrum ,  ultra high vacuum ,  crystal orientation ,  *silicon ,  Tungsten ,  atomic hydrogen ,  hydrogen gas ,  Silicon(111)
Semi thesaurus term： 水素源 ,  low energy electron diffraction

JST classification (2)： Gas chemical industry  (YB02070O) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (11)：

• 1) K. Oura, V. G. Lifshits, A. A. Saranin, A. V. Zotov and M. Katayama: Surf. Sci. Rep., 35 (1999) 1.
• 2) J. T. Yates, Jr.: Experimental Innovations in Surface Science -A Guide to Practical Laboratory Methods and Instruments, (Springer-Verlag, New York, 1998) p. 682.
• 3) F. Watanabe: J. Vac. Sci. Technol. A, 22 (2004) 181.
• 4) F. Watanabe: J. Vac. Sci. Technol. A, 22 (2004) 739.
• 5) F. Watanabe: Shinku, 49 (2006) 349.

Terms in the title (2)： 脱ガス ,  原子状水素