Art

J-GLOBAL ID：201402225242532922   Reference number：14A0454750

Effects of Deposition Temperature on the Electrochemical Deposition of Zinc Oxide Thin Films from a Chloride Solution

塩化物溶液からの酸化亜鉛薄膜の電気化学堆積に及ぼす堆積温度の効果

Author (7)： HORI Shigeo (Environment and Renewable Energy Systems, Gifu Univ.) ,  SUZUKI Toshimasa (Environment and Renewable Energy Systems, Gifu Univ.) ,  SUZUKI Toshimasa (Dep. of Electrical and Electronic Engineering, Gifu Univ.) ,  SUZUKI Tsukasa (Environment and Renewable Energy Systems, Gifu Univ.) ,  MIURA Shuhei (Environment and Renewable Energy Systems, Gifu Univ.) ,  NONOMURA Shuichi (Environment and Renewable Energy Systems, Gifu Univ.) ,  NONOMURA Shuichi (Dep. of Electrical and Electronic Engineering, Gifu Univ.)
Material： Materials Transactions  (Mater Trans)
Volume： 55  Issue： 4  Page： 728-734 (J-STAGE)  Publication year： 2014 
JST Material Number： G0668A  ISSN： 1345-9678  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： chloride ,  solution(liquid) ,  *zinc oxide ,  *thin film ,  energy ,  band gap ,  carrier density ,  *electrodeposition ,  machining temperature ,  valence electron ,  donor ,  anion ,  electrical property ,  optical property ,  temperature dependence
Semi thesaurus term： band-gap energy ,  chlorine ion

JST classification (1)： Oxide thin films  (BK14050P)

Reference (47)：

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• 5) W. Liu, F. Xiu, K. Sun, Y. Xie, K. L. Wang, Y. Wang, J. Zou, Z. Yang and J. Liu: J. Am. Chem. Soc. 132 (2010) 2498.

Terms in the title (5)： 塩化物 ,  溶液 ,  酸化亜鉛薄膜 ,  電気化学堆積 ,  堆積