Art

J-GLOBAL ID：201402278143073157   Reference number：14A0854181

Effect of annealing on the mechanical and scratch properties of BCN films obtained by magnetron sputtering deposition

マグネトロンスパッタリング堆積により得たBCN膜の機械的及び引かき特性に及ぼすアニーリングの効果

Author (5)： XU Shuyan (Key Lab. of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province ...) ,  MA Xinxin (School of Material Sci. and Engineering, Harbin Inst. of Technol., Harbin 150001, CHN) ,  WEN Huiying (Key Lab. of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province ...) ,  TANG Guangze (School of Material Sci. and Engineering, Harbin Inst. of Technol., Harbin 150001, CHN) ,  LI Chunwei (Key Lab. of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province ...)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 313  Page： 823-827  Publication year： Sep. 15, 2014 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *boron compound ,  *carbon compound ,  *nitride ,  *magnetron sputtering ,  *annealing (heat treatment) ,  degradation product ,  *Elastic Modulus ,  temperature dependence ,  friction coefficient ,  *wafer ,  *microhardness ,  *scratch hardness ,  *ceramic coating ,  *boron carbon nitride ,  DC magnetron sputtering ,  Si wafer
Semi thesaurus term： silicon substrate

JST classification (3)： Thin films of other inorganic compounds  (BK14060A) ,  Ceramic coating to nonmetallic materials  (YC02040K) ,  Mechanical properties of solids in general  (BL01021C)

Terms in the title (3)： マグネトロンスパッタリング ,  堆積 ,  アニーリング