Art

J-GLOBAL ID：201502213867217499   Reference number：15A0923657

Drying dissipative patterns of aqueous solution of poly(methacrylic acid) and its salt neutralized half

ポリ(メタクリル酸)とその半中和塩の水溶液の散逸パターンの乾燥

Author (5)： OKUBO Tsuneo (Inst. for Colloidal Organization, Hatoyama 3-1-112, 611-0012, Uji, Kyoto, JPN) ,  HAGIWARA Akira (Univ. of Toyama, Dep. of Applied Chemistry, Graduate School of Sci. and Engineering, 930-8555, Toyama, JPN) ,  KITANO Hiromi (Univ. of Toyama, Dep. of Applied Chemistry, Graduate School of Sci. and Engineering, 930-8555, Toyama, JPN) ,  TAKAHASHI Shinya (Gifu Univ., Dep. of Applied Chemistry, Fac. of Engineering, Yanagido 1, 501-1193, Gifu, JPN) ,  TSUCHIDA Akira (Gifu Univ., Dep. of Applied Chemistry, Fac. of Engineering, Yanagido 1, 501-1193, Gifu, JPN)
Material： Colloid and Polymer Science  (Colloid Polym Sci)
Volume： 293  Issue： 8  Page： 2137-2146  Publication year： Aug. 2015 
JST Material Number： C0415A  ISSN： 0303-402X  CODEN： CPMSB  Document type： Article
Article type： 原著論文  Country of issue： Germany, Federal Republic of (DEU)  Language： ENGLISH (EN)

Thesaurus term： *polymethacrylic acid ,  *drying ,  *pattern formation ,  neutralization ,  *polymer solution ,  *aqueous solution ,  sodium hydroxide ,  hygroscopicity ,  affinity ,  excluded volume effect ,  *structure ,  *polymer aqueous solution
Semi thesaurus term： neutralization ,  *dissipative structure

JST classification (1)： Physical properties of polymer solutions  (CG02013S)

Terms in the title (5)： メタクリル酸 ,  中和 ,  塩 ,  水溶液 ,  散逸