Art

J-GLOBAL ID：201502236630019870   Reference number：15A0546050

Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography

ArF液浸フォトリソグラフィーで作製したSiワイヤアレイ導波路回折格子の位相誤差の評価

Author (14)： MURAMATSU Kyosuke (School of Integrated Design Engineering, Graduate School of Sci. and Technol., Keio Univ.) ,  ASAKURA Hideaki (School of Integrated Design Engineering, Graduate School of Sci. and Technol., Keio Univ.) ,  SUZUKI Keijiro (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  TANIZAWA Ken (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  TOYAMA Munehiro (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  OHTSUKA Minoru (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  YOKOYAMA Nobuyuki (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  MATSUMARO Kazuyuki (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  SEKI Miyoshi (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  KOSHINO Keiji (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  IKEDA Kazuhiro (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  NAMIKI Shu (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  KAWASHIMA Hitoshi (National Inst. of Advanced Industrial Sci. and Technol. (AIST)) ,  TSUDA Hiroyuki (School of Integrated Design Engineering, Graduate School of Sci. and Technol., Keio Univ.)
Material： IEICE Electronics Express (Web)  (IEICE Electron Express (Web))
Volume： 12  Issue： 7  Page： 20150019-20150019 (J-STAGE)  Publication year： 2015 
JST Material Number： U0039A  ISSN： 1349-2543  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *argon compound ,  *fluoride ,  *photolithography ,  numerical aperture ,  exposure (photography) ,  *silicon ,  *diffraction grating ,  array circuit ,  *optical waveguide ,  *error (measure) ,  evaluation ,  frequency domain ,  *Interferometry ,  measurement accuracy ,  refractive index ,  phase (topology) ,  argon fluoride ,  wire-array ,  error evaluation ,  *arrayed waveguide grating
Semi thesaurus term： *arrayed waveguide grating ,  *phase error ,  immersion lithography

JST classification (2)： Optical waveguide,optical fibers,and fiber optics  (BD06030H) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (7)：

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Terms in the title (9)： ARF ,  液浸 ,  フォトリソグラフィー ,  作製 ,  Si ,  ワイヤ ,  アレイ導波路回折格子 ,  位相誤差 ,  評価