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J-GLOBAL ID:201502271080245826   Reference number:15A0434657

CRYSTALLIZATION PROPERTIES OF CeO2 THIN FILMS DEPOSITED BY MOCVD WITH ADDITIONAL TEOS INTRODUCTION

余分にTEOSを導入したMOCVDにより蒸着したCeO2薄膜の結晶化特性
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Issue: 33  Page: 70-76  Publication year: Mar. 2015 
JST Material Number: L0263A  ISSN: 0914-2908  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
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Oxide thin films 
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