Art

J-GLOBAL ID：201602212529077862   Reference number：16A1116729

Hydrogen desorption kinetics from H-Si (111) surfaces studied by optical sum frequency generation and second harmonic generation

光和周波発生と第二高調波発生により研究したH-Si(111)表面からの水素脱離の速度論

Author (5)： Sattar Md. Abdus (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292, Japan) ,  Hien Khuat Thi Thu (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292, Japan) ,  Miyauchi Yoshihiro (Department of Applied physics, National Defense Academy of Japan, Hashirimizu 1-10-20, Yokosuka, Kanagawa, 239-8686, Japan) ,  Mizutani Goro (School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292, Japan. [e-mail]) ,  Rutt Harvey N. (School of Electronics and Computer Science, University of Southampton, Southampton, SO17 1BJ, UK)
Material： Surface and Interface Analysis  (SIA)
Volume： 48  Issue： 11  Page： 1235-1239  Publication year： Nov. 2016 
JST Material Number： E0709A  ISSN： 0142-2421  CODEN： SIANDQ  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： sum frequency generation ,  Second Harmonic Generation ,  *silicon ,  *surface ,  *hydrogen ,  surface structure ,  desorption ,  spectroscopy
Semi thesaurus term： *monomolecular film ,  sum-frequency generation spectroscopy

Author keywords (5)： sum frequency generation (SFG) ,  second harmonic generation (SHG) ,  Si (111)1 × 1 surface ,  desorption order ,  hydrogen coverage

JST classification (3)： Surface structure of solids in general  (BK15010E) ,  Spectroanalysis  (CC03012W) ,  Study of adsorption by physical means  (CB12043P)

Terms in the title (6)： 和周波発生 ,  第二高調波発生 ,  研究 ,  Si ,  水素脱離 ,  速度論