Art
J-GLOBAL ID：201602252308248696   Reference number：16A1274035

Effects of annealing temperature on characteristics of amorphous nickel carbon thin film alloys deposited on n-type silicon substrates by reactive sputtering

Author (2)：
Hong Zih-Chen

About Hong Zih-Chen

(Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan)

About Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan

, 
Shiue Sham-Tsong

About Shiue Sham-Tsong

(Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan)

About Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan


Material：
Thin Solid Films

About Thin Solid Films


Volume： 618  Issue： PA  Page： 21-27  Publication year： 2016 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Abstract/Point：
Abstract/Point
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The amorphous nickel carbon (a...
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Author keywords (4)：
Carbon

About Carbon

, 
Nickel

About Nickel

, 
Annealing temperature

About Annealing temperature

, 
Reactive sputtering

About Reactive sputtering


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