Art
J-GLOBAL ID:201702272370801938   Reference number:17A0132884

In situ TEM study of electron-beam radiation induced boron diffusion and effects on phase and microstructure evolution in nanostructured CoFeB/SiO2 thin film

ナノ構造CoFeB/SiO2ナノ構造薄膜中の電子ビーム誘起ホウ素拡散のその場TEM研究と相及び微細構造発展への効果
Author (8):
Material:
Volume: 121  Issue:Page: 015111-015111-11  Publication year: Jan. 07, 2017 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Abstract/Point:
Abstract/Point
Japanese summary of the article(about several hundred characters).
All summary is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Using in situ transmission ele...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=17A0132884&from=J-GLOBAL&jstjournalNo=C0266A") }}
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

JST classification (2):
JST classification
Category name(code) classified by JST.
Metallic thin films  ,  Irradiational changes of metals 

Return to Previous Page