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J-GLOBAL ID:201702279576809017   Reference number:17A1359911

Performance and electrostatic improvement by high-pressure anneal on Si-passivated strained Ge pFinFET and gate all around devices with superior NBTI reliability

すべての優れたNBTI信頼性を有する装置周辺のSiで不活性化した歪んだGe pFinFETとゲートに及ぼす高圧アニールによる性能と静電改善【Powered by NICT】
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Volume: 2017  Issue: VLSI Technology  Page: T196-T197  Publication year: 2017 
JST Material Number: W2441A  Document type: Proceedings
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Transistors 

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