Art

J-GLOBAL ID：201802225281154070   Reference number：18A0111304

Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

Author (7)： OCHIAI Shunsuke (Yamaguchi Univ., Ube, JPN) ,  TAKAYAMA Tomohiro (Yamaguchi Univ., Ube, JPN) ,  KISHIMURA Yukiko (Yamaguchi Univ., Ube, JPN) ,  ASADA Hironori (Yamaguchi Univ., Ube, JPN) ,  SONODA Manae (Miyakonojo Coll., Miyakonojo, JPN) ,  IWAKUMA Minako (Miyakonojo Coll., Miyakonojo, JPN) ,  HOSHINO Ryoichi (Fine Materal System Inc., Tokyo, JPN)
Material： Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)
Volume： 10454  Page： 1045414.1-1045414.6  Publication year： 2017 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Country of issue： United States (USA)  Language： ENGLISH (EN)