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J-GLOBAL ID:201802230672613694   Reference number:18A2161644

Mechanism of asymmetric etched profiles in trimming process

トリミング工程における非対称エッチングプロファイルの機構
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Volume: 57  Issue: 10  Page: 106201.1-106201.8  Publication year: Oct. 2018 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
Reference (30):
  • K. K. Young, IEEE. Trans. Electron Devices 36, 399 (1989).
  • N. Sugii, K. Nakagawa, S. Yamaguchi, and M. Miyao, Appl. Phys. Lett. 75, 2948 (1999).
  • J. L. Hoyt, H. M. Nayfeh, S. Eguchi, I. Aberg, G. Xia, T. Drake, E. A. Fitzgerald, and D. A. Antoniadis, IEDM Tech. Dig., 2002, p. 23.
  • K. Mistry, C. Allen, C. Auth, B. Beattie, D. Bergstrom, M. Bost, M. Brazier, M. Buehler, A. Cappellani, R. Chau, C.-H. Choi, G. Ding, K. Fischer, T. Ghani, R. Grover, W. Han, D. Harken, M. Hattendorf, J. He, J. Hicks, R. Huessner, D. Ingerly, P. Jain, R. James, L. Jong, S. Joshi, C. Kenyon, K. Kuhn, K. Lee, H. Liu, J. Maiz, B. McIntyre, P. Moon, J. Neirynck, S. Pae, C. Parkar, D. Parsons, C. Prasad, L. Pipes, M. Prince, P. Ranade, T. Reynolds, J. Sandford, L. Shifren, J. Sebastian, J. Seiple, D. Simon, S. Sivakumar, P. Smith, C. Thomas, T. Troeger, P. Vandervoorn, S. Williams, and K. Zawadzki, IEDM Tech. Dig., 2007, p. 247.
  • D. Hisamoto, T. Kaga, Y. Kawamoto, and E. Takeda, IEDM Tech. Dig., 1989, p. 833.
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