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J-GLOBAL ID:201802239113302613   Reference number:18A0226445

S雰囲気中フラッシュ蒸着によるSi(001)上CuInS2薄膜のエピタキシャル成長

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Volume: J100-C  Issue: 11  Page: 545-548 (WEB ONLY)  Publication year: Nov. 01, 2017 
JST Material Number: U0472A  ISSN: 1881-0217  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Techniques and equipment of thin film deposition 
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