Art
J-GLOBAL ID:201802241055026145   Reference number:18A0012760

Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing

材料加工のための旋回正方形容量性RF放電プラズマスパッタリングソースの性能
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Material:
Volume: 37  Issue:Page: 1663-1677  Publication year: Nov. 2017 
JST Material Number: H0836A  ISSN: 0272-4324  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Techniques and equipment of thin film deposition  ,  Sputtering 

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