Art
J-GLOBAL ID:201802263238409479   Reference number:18A1383622

Large reduction of threading dislocations in diamond by hot-filament chemical vapor deposition accompanying W incorporations

W導入に伴う熱フィラメント化学蒸着によるダイヤモンド中の貫通転位の大きな減少【JST・京大機械翻訳】
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Volume: 113  Issue:Page: 032108-032108-4  Publication year: 2018 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Dislocations in semiconductor ...
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Semiconductor thin films  ,  Lattice defects in semiconductors 
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