Art
J-GLOBAL ID:201902219757939390   Reference number:19A1416649

Effects of the deposition rate on growth modes of Ag islands on the hydrogen-terminated Si(111)-(1 × 1) surface: The role of surface energy and quantum size effect

水素終端Si(111)-(1×1)表面上のAg島の成長モードに及ぼす堆積速度の影響:表面エネルギーと量子サイズ効果の役割【JST・京大機械翻訳】
Author (10):
Material:
Volume: 122  Issue:Page: 095303-095303-7  Publication year: 2017 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Abstract/Point:
Abstract/Point
Japanese summary of the article(about several hundred characters).
All summary is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
We have investigated the early...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=19A1416649&from=J-GLOBAL&jstjournalNo=C0266A") }}
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

JST classification (1):
JST classification
Category name(code) classified by JST.
Metallic thin films 

Return to Previous Page