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J-GLOBAL ID:201902223506381264   Reference number:19A1416244

Atomistic simulations of carbon diffusion and segregation in liquid silicon

液体シリコン中の炭素拡散と偏析の原子論的シミュレーション【JST・京大機械翻訳】
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Volume: 122  Issue: 22  Page: 225705-225705-9  Publication year: 2017 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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The diffusivity of carbon atom...
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Lattice defects in semiconductors 
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