Art
J-GLOBAL ID:201902233250906448   Reference number:19A0071133

Microstructured SiOx thin films deposited from hexamethyldisilazane and hexamethyldisiloxane using atmospheric pressure thermal microplasma jet

大気圧熱マイクロプラズマジェットを用いたヘキサメチルジシラザンとヘキサメチルジシロキサンから堆積した微細構造SiO_x薄膜【JST・京大機械翻訳】
Author (5):
Material:
Volume: 669  Page: 321-328  Publication year: 2019 
JST Material Number: B0899A  ISSN: 0040-6090  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
Abstract/Point:
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Mictrostructured silicon oxide...
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JST classification (2):
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Thin films of other inorganic compounds  ,  Oxide thin films 
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