Art

J-GLOBAL ID：201902240141036890   Reference number：19A1414751

Atom manipulation method to substitute individual adsorbate atoms into a Si(111)-(7 × 7) substrate at room temperature

室温でのSi(111)-(7×7)基板への個々の吸着原子を置換するための原子操作法【JST・京大機械翻訳】

Author (4)： Yurtsever Ayhan (Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan) ,  Abe Masayuki (Graduate School of Engineering Science, Osaka University, 1-1 Machikaneyama, Toyonaka, Osaka 560-0043, Japan) ,  Morita Seizo (Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan) ,  Sugimoto Yoshiaki (Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan)
Material： Applied Physics Letters  (Appl Phys Lett)
Volume： 111  Issue： 23  Page： 233102-233102-5  Publication year： 2017 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： We demonstrate a method to sub...

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Thesaurus term： *silicon ,  scanning tunneling microscope ,  nanomaterial ,  doping ,  *substrate (plate) ,  atomic force microscope ,  tin ,  Lead ,  single atom ,  unit cell ,  *adatom
Semi thesaurus term： AFMチップ ,  *原子操作 , 【Automatic Indexing@JST】

JST classification (3)： Semiconductor thin films  (BK14040E) ,  Surface structure of semiconductors  (BK15030A) ,  Study of adsorption by physical means  (CB12043P)

Terms in the title (5)： 室温 ,  Si ,  吸着原子 ,  置換 ,  原子操作