Art

J-GLOBAL ID：201902264528858361   Reference number：19A0610537

Field-Emission from Finely Nicked Structures on n-Type Silicon Substrate Formed by Sandblasting Process

サンドブラスト法により形成したn型シリコン基板上の微細傷構造からの電界放出

Author (2)： YOSHIMOTO Tomomi (Department of Electrical, Electronic and Communication Engineering, Faculty of Science and Engineering, Toyo University) ,  IWATA Tatsuo (Graduate School of Engineering, Mie University)
Material： IEICE Transactions on Electronics (Web)  (IEICE Trans Electron (Web))
Volume： E102.C  Issue： 2  Page： 207-210(J-STAGE)  Publication year： 2019 
JST Material Number： U0468A  ISSN： 1745-1353  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *blast cleaning ,  *silicon ,  *surface treatment ,  field emission ,  nano particle ,  *electrode ,  electric current ,  alumina particle ,  *sand blasting ,  roughening ,  *cleaning (purification) ,  *cleaning (washing)
Semi thesaurus term： *N-type silicon ,  *field emitter ,  emission current

Author keywords (3)： field emission ,  Si ,  sandblasting process

JST classification (2)： Thermoionic emission and field emission  (BM09020S) ,  Other surface treatment  (WC08070F)

Reference (16)：

• [1] Y. Gotoh, M. Nagao, T. Masuzawa, Y. Neo, H. Mimura, T. Okamoto, M. Akiyoshi, and I. Takagi, “Research project on development of radiation tolerant compact image sensor with a field emitter array,” Technical Digest of the 28th International Vacuum Nanoelectronics Conference, Gangzhou, P.R. China, pp.240-241, 2015. 10.1109/ivnc.2015.7225596
• [2] H. Mimura, “Radiation tolerant vacuum image sensors with a cold cathode array,” Oyobutsuri, vol.85, pp.15-20, 2016. [in Japanese]
• [3] Y. Gotoh, “Novel Applications of Field Emitter Arrays ∼Towards Electron Devices under Harsh Environments and Light Sources∼, J. Vac. Soc. Jpn., vol.60, no.2, pp.55-63, 2017. [in Japanese] 10.3131/jvsj2.60.55
• [4] M. Yanagihara, M.Z. Yusop, M. Tanemura, S. Ono, T. Nagami, K. Fukuda, T. Suyama, Y. Yokota, T. Yanagida, and A. Yoshikawa, Vacuum ultraviolet field emission lamp utilizing KMgF₃ thin film phosphor, Apl Materials, vol.2, no.4, 046110, 2014. 10.1063/1.4871915
• [5] S. Kanemaru, T. Hirano, H. Tanoue, and J. Itoh, “Control of emission currents from silicon field emitter arrays using a built-in MOSFET,” Appl. Sur. Sci., vol.111, pp.218-223, 1997. 10.1016/s0169-4332(96)00719-2

Terms in the title (5)： サンドブラスト法 ,  N型シリコン ,  微細 ,  傷 ,  電界放出