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J-GLOBAL ID：201902265903806464   Reference number：19A0372336

Fermi Level Engineering of Mn₂Ru_xGa Thin Films

Mn_2Ru_xGa薄膜のFermi準位エンジニアリング【JST・京大機械翻訳】

Author (9)： Siewierska K. E. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Atcheson G. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Jha A. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Smith R. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Dennehy G. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Lenne S. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Stamenov P. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Coey J.M.D. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland) ,  Rode K. (School of Physics and CRANN, University of Dublin, Trinity College, Dublin, Ireland)
Material： IEEE Conference Proceedings  (IEEE Conf Proc)
Volume： 2018  Issue： NANO  Page： 1-2  Publication year： 2018 
JST Material Number： W2441A  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： $¥text{Mn}_{2}¥text{Ru}_{¥math...

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Thesaurus term： X-ray reflection ,  magnetic property ,  density functional method ,  X-ray diffraction ,  magnetic reluctance ,  spin polarization ,  *ruthenium ,  Andreev reflection ,  structural property ,  *manganese ,  occupancy ,  *Fermi level ,  *thin film ,  metalloid ,  magnetron sputtering

JST classification (1)： Graphic and image processing in general  (JE04010I)

Terms in the title (3)： 薄膜 ,  Fermi準位 ,  エンジニアリング