Art

J-GLOBAL ID：201902265988314185   Reference number：19A2111609

Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst

タンタル熱線触媒により生成した水素ラジカルを用いたフォトレジスト除去【JST・京大機械翻訳】

Author (5)： Yamamoto Masashi (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College, 355 Chokushi-cho, Takamatsu, Kagawa 761-8058, Japan) ,  Shiroi Tomohiro (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College, 355 Chokushi-cho, Takamatsu, Kagawa 761-8058, Japan) ,  Shikama Tomokazu (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College, 355 Chokushi-cho, Takamatsu, Kagawa 761-8058, Japan) ,  Nagaoka Shiro (Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College, 551 Kohda, Takuma-cho, Mitoyo, Kagawa 769-1192, Japan) ,  Horibe Hideo (Graduate School of Engineering, Osaka City University, 3-3-138, Sugimoto, Sumiyoshi, Osaka 558-8585, Japan)
Material： AIP Conference Proceedings  (AIP Conf Proc)
Volume： 2151  Issue： 1  Page： 020010-020010-6  Publication year： 2019 
JST Material Number： D0071C  ISSN： 0094-243X  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Photoresist removal method usi...

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Thesaurus term： surface temperature ,  elemental analysis ,  adaptability ,  *Hydrogen ,  *catalyst ,  *photoresist ,  *Tantalum ,  tantalum catalyst ,  *hydrogen radical ,  *heat ray
Semi thesaurus term： 除去率 , 【Automatic Indexing@JST】

JST classification (2)： Other pollutants  (SB05040W) ,  Spark ignition engines  (PB02020C)

Terms in the title (5)： タンタル ,  熱線 ,  触媒 ,  水素ラジカル ,  フォトレジスト