Art

J-GLOBAL ID：201902287345428835   Reference number：19A1553804

Adaptive low-temperature covalent bonding of III-nitride thin films by extremely thin water interlayers

極端に薄い水中間層によるIII-窒化物薄膜の適応低温共有結合【JST・京大機械翻訳】

Author (11)： Gerrer Thomas (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Graff Andreas (Fraunhofer Institute for Microstructure of Materials and Systems, Walter-Huelse-Strasse 1, 06120 Halle, Germany) ,  Simon-Najasek Michel (Fraunhofer Institute for Microstructure of Materials and Systems, Walter-Huelse-Strasse 1, 06120 Halle, Germany) ,  Czap Heiko (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Maier Thomas (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Benkhelifa Fouad (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Mueller Stefan (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Nebel Christoph (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Waltereit Patrick (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Quay Ruediger (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany) ,  Cimalla Volker (Fraunhofer Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg, Germany)
Material： Applied Physics Letters  (Appl Phys Lett)
Volume： 114  Issue： 25  Page： 252103-252103-5  Publication year： 2019 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Direct low-temperature bond te...

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Thesaurus term： *thin film ,  diamond ,  reconstitution ,  *covalent bond ,  interface(surface) ,  *nitride ,  substrate(plate) ,  aluminum hydroxide ,  chemical process ,  recrystallization ,  aluminum nitride ,  surface course ,  *low temperature
Semi thesaurus term： 薄膜素子 ,  *中間層 , 【Automatic Indexing@JST】

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (7)： 水 ,  中間層 ,  窒化物 ,  薄膜 ,  適応 ,  低温 ,  共有結合