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J-GLOBAL ID:202002230649897678   Reference number:20A0749937

Proposal of Intelligent Polishing System by Artificial Intelligence Using Neural Networks

ニューラルネットワークを用いたAIによる知能研磨システムの提案
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Volume: 86  Issue:Page: 80-86(J-STAGE)  Publication year: 2020 
JST Material Number: U0462A  ISSN: 1882-675X  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Reference (23):
  • 1) International Energy Agency (IEA): World Energy Outlook 2018, https://www.bp.com/content/dam/bp/businesssites/en/global/corporate/pdfs/energy-economics/energy-outlook/bp-energyoutlook-2018.pdf, (2019/2/4).
  • 2) 山崎雅也: パワー半導体業界-電動化により成長加速-, 野村證券財界観測, (2018).
  • 3) 菅井和己: 最先端Si半導体デバイスにおけるCMPプロセス, 精密工学会誌, 78, 11 (2012) 928.
  • 4) 玉井一誠, 森永 均: Si, サファイア, SiC, GaNの研磨とそのメカニズム, 日本学術振興会「結晶加工と評価技術」第145委員会第127回研究会, (2011) 8.
  • 5) A.T.Budnikou, E.A.Vovk, S.I.Krivonogou, A.Ya.Danko, O.A.Lukiyenko: Anisotropy of sapphire properties associated with chemical - mechanical polishing with silica, Functional Materials, 17, 4 (2010) 488.
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