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J-GLOBAL ID:202002246882366463   Reference number:20A1046860

Laser-Assisted Wet Etching of Silicon Back Surfaces Using 1552 nm Femtosecond Laser

1552nmフェムト秒レーザを用いたシリコン裏側表面のレーザ支援湿式エッチング
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Material:
Issue: 25  Page: 7-13  Publication year: Mar. 2020 
JST Material Number: L3380A  ISSN: 1341-7908  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

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Manufacturing technology of solid-state devices  ,  Special machining 
Reference (24):
  • [1] X. Q. Liu, L. Yu, Z. C. Ma and Q. D. Chen: Silicon Three-Dimensional Structures Fabricated by Femtosecond Laser Modification with Dry Etching, Applied Optics, Vol.56, No.8, (2017) pp.2157-2161.
  • [2] S. Yadavali, D. Lee and D. Issadore: Robust Microfabrication of Highly Parallelized Three-Dimensional Microfluidics on Silicon, Scientific Reports 9, 12213 (2019) pp.1-10.
  • [3] C. M. Waits, B. Morgan, M. Kastantin, and R. Ghodssi: Microfabrication of 3D Silicon MEMS Structures Using Gray-Scale Lithography and Deep Reactive Ion Etching, Sensors and Actuators A: Physical, Vol.119, Issue 1, (2005) pp.245-253.
  • [4] S. Lee, K. Jo, H. Keum, Sangmin Chae, Y. Kim, J. Choi, H. H. Lee, and H. J. Kim: Nanowall Formation by Maskless Wet-Etching on a Femtosecond Laser Irradiated Silicon Surface, Applied Surface Science, Vol.437, (2018) pp.190-194.
  • [5] S. Kiyama, S. Matsuo, S. Hashimoto, and Y. Morihira: Examination of Etching Agent and Etching Mechanism on Femtosecond Laser Microfabrication of Channels Inside Vitreous Silica Substrates, Journal of Physical Chemistry C, Vol.113, (2009) pp.11560-11566.
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