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J-GLOBAL ID：202002260166275721   Reference number：20A1020906

Comparison of SEM and AFM performances for LER reference metrology

LER参照計測のためのSEMとAFM性能の比較【JST・京大機械翻訳】

Author (4)： Kizu Ryosuke (National Institute of Advanced Industrial Science and Technology (Japan)) ,  Misumi Ichiko (National Institute of Advanced Industrial Science and Technology (Japan)) ,  Hirai Akiko (National Institute of Advanced Industrial Science and Technology (Japan)) ,  Gonda Satoshi (National Institute of Advanced Industrial Science and Technology (Japan))
Material： Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)
Volume： 11325  Page： 113250Q-8  Publication year： 2020 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Line edge roughness (LER) meas...

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Thesaurus term： noise (signal) ,  correlation function ,  scanning electron microscope ,  electron microscopy ,  semiconductor device ,  gradient method ,  standard deviation ,  autocorrelation function ,  two dimension ,  *three dimension ,  correlation length ,  power spectral density ,  atomic force microscope ,  nano scale ,  Microscopy, Atomic Force
Semi thesaurus term： ラインエッジ粗さ , 【Automatic Indexing@JST】

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Terms in the title (5)： LER ,  参照 ,  計測 ,  SEM ,  AFM