Art

J-GLOBAL ID：202002262990928955   Reference number：20A2529165

Dual-Beam Irradiation Stability of Amorphous Silicon Oxycarbide at 300°C and 500°C

300°Cおよび500°Cにおける非晶質けい素オキシカーバイドの二重ビーム照射安定性【JST・京大機械翻訳】

Author (9)： Su Qing (Department of Mechanical and Materials Engineering, University of Nebraska-Lincoln, Lincoln, NE, USA) ,  Greaves Graeme (School of Computing and Engineering, University of Huddersfield, Huddersfield, UK) ,  Donnelly Stephen E. (School of Computing and Engineering, University of Huddersfield, Huddersfield, UK) ,  Mizuguchi Shoki (Department of Materials Science and Engineering, Kyushu Institute of Technology, Tobata, Kitakyushu, Fukuoka, Japan) ,  Ishimaru Manabu (Department of Materials Science and Engineering, Kyushu Institute of Technology, Tobata, Kitakyushu, Fukuoka, Japan) ,  Nastasi Michael (Department of Mechanical and Materials Engineering, University of Nebraska-Lincoln, Lincoln, NE, USA) ,  Nastasi Michael (Nebraska Center for Energy Sciences Research, University of Nebraska-Lincoln, Lincoln, NE, USA) ,  Nastasi Michael (Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA) ,  Nastasi Michael (Department of Nuclear Engineering, Texas A&M University, College Station, TX, USA)
Material： JOM
Volume： 72  Issue： 11  Page： 4002-4007  Publication year： 2020 
JST Material Number： C0321A  ISSN： 1047-4838  Document type： Article
Article type： 原著論文  Country of issue： Germany, Federal Republic of (DEU)  Language： ENGLISH (EN)

Abstract/Point： Abstract: The irradiation stab...

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Thesaurus term： nuclear reactor ,  bubble ,  crystallization ,  thin film ,  helium ,  phase separation ,  *amorphous state ,  structural material ,  *amorphous silicon
Semi thesaurus term： 温度範囲 ,  対分布関数 ,  シリコンオキシカーバイド ,  原子炉運転 ,  非晶質構造 ,  その場TEM , 【Automatic Indexing@JST】

JST classification (2)： Irradiational changes of metals  (BK16122N) ,  Dispersion hardening alloys  (WE04030R)

Terms in the title (3)： 非晶質けい素 ,  二重ビーム ,  安定性